Back to Top

Vacuum Coating

Vacuum Coating

Creating the Materials of the Future

Thin film coatings are deposited on surfaces for a wide variety of applications including semiconductors, solar panels, food packaging and optical lenses, among moany others. Vacuum coating can be broken down into two main types; physical vapour deposition (PVD) and chemical vapour deposition (CVD). PVD processes include magnetron sputtering, HiPIMS and pulsed laser deposition (PLD). CVD process are often enhanced using plasma i.e. PECVD.

Impedans offer a range of products suitable for monitoring your vacuum deposition plasma processing equipment. We have products suited for research and development work such as process development or new tool design. We also have products for live monitoring of process tools in the fab during production.



PVD | Magnetron Sputtering | HiPIMS | ALD | PLD | PECVD


Contact us today to discuss your deposition process diagnostic requirements.
Our expertise is second to none.


Integrated Sensors for Production

Providing real-time process feedback to enable critical decision making


OCTIV
INDUSTRIAL

RF Sensing Platform

Features
Ethernet Enabled | Industrial Communication Protocols | Customisable Form Factor | Full Integration Service

Applications
Process Health | Chamber Matching | Process Fingerprinting | Fault Detection | Substrate Placement


ALFVEN
100

RF Event Detection

Features
Ethernet Enabled | Industrial Communication Protocols | Pre-Match Design | Full Integration Service

Applications
Process Arcs | Instabilities | Ingition Phenomena | Missing RF Pulses


Substrate & Surface Level Measurement

Seeing the ions that drive your plasma process


SEMION

Ion Energy Distribution Analysis

Features
Substrate Bias Compatible | High RF Bias Resistant | Easily Installed | High Temperature Resistant

Applications
Process Parameters Correlation with Process Outcome | Process Uniformity | Process Development | Equipment Design


VERTEX

Ion Energy Distribution versus Aspect Ratio

Features
Substrate Bias Compatible | High RF Bias Resistant | Easily Installed | High Temperature Resistant

Applications
High Aspect Ratio Processing | Process Uniformity | Process Development | Equipment Design


QUANTUM

Etch & Deposition Rates | Ion Energy Distributions

Features
Substrate Bias Compatible | High RF Bias Resistant | Easily Installed | High Temperature Resistant

Applications
Ion Versus Neutral Deposition Rate Comparison | Process Development | Equipment Design



Plasma Volume Measurement

Measuring charged particle concentrations and temperatures and the potential distribution of your discharge


LANGMUIR

Plasma Volume Characterisation

Features
Single & Double Probe Combined | Advanced RF Compensation | High Speed Acqusition | Spatial Scanning

Applications
Fundamental Research | Process Development | Equipment Design | Model Validation


PLATO

Deposition Tolerant Langmuir Probe

Features
Deposition Tolerant | High Speed Acqusition | Spatial Scanning | Customisable Form Factor for Process Integration

Applications
Fundamental Research | Process Development | Equipment Design | Model Validation


General RF Power & Impedance

Determining the health of your RF process using our unique RF sensing platform


OCTIV

RF Sensing Platform

Features
Interchangeable Connectors | USB & RS232 Protocols | Multiple Frequency Ranges on One Unit | Wide Power Range

Applications
Power Metering | Match Network Characterization | RF Subsystem Health | Process Monitoring