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Scientfic instruments for R&D

R&D

Measuring What is Often Thought Impossible

Impedans offer a range of products for RF and plasma measurement. Whether you want to measure RF characteristics externally on the RF path or you want to measure plasma properties in-situ, we have a solution for you.

Investigate fundamental physics and verify models. Design and verify new equipment and processes. Check process uniformity. Determine if your process is the same today as it was yesterday or last week.

Impedans’ product range includes RF sensors for any RF power delivery application and plasma sensors for plasma process measurement. Our Langmuir probes give you insight to plasma volume characteristics, while our Retarding Field Analyzers provide you with detailed information about charged particle impact at the substrate level.


We’ve spent decades automating plasma measurement,
allowing you to focus on your research


Substrate & Surface Level Measurement

Seeing the ions that drive your plasma process


SEMION

Ion Energy Distribution Analysis

Features
Substrate Bias Compatible | High RF Bias Resistant | Easily Installed | High Temperature Resistant

Applications
Process Parameters Correlation with Process Outcome | Process Uniformity | Process Development | Equipment Design


VERTEX

Ion Energy Distribution versus Aspect Ratio

Features
Substrate Bias Compatible | High RF Bias Resistant | Easily Installed | High Temperature Resistant

Applications
High Aspect Ratio Processing | Process Uniformity | Process Development | Equipment Design


QUANTUM

Etch & Deposition Rates | Ion Energy Distributions

Features
Substrate Bias Compatible | High RF Bias Resistant | Easily Installed | High Temperature Resistant

Applications
Ion Versus Neutral Deposition Rate Comparison | Process Development | Equipment Design



Plasma Volume Measurement

Measuring charged particle concentrations and temperatures and the potential distribution of your discharge


LANGMUIR

Plasma Volume Characterisation

Features
Single & Double Probe Combined | Advanced RF Compensation | High Speed Acquisition | Spatial Scanning

Applications
Fundamental Research | Process Development | Equipment Design | Model Validation


PLATO

Deposition Tolerant Langmuir Probe

Features
Deposition Tolerant | High Speed Acquisition | Spatial Scanning | Customisable Form Factor for Process Integration

Applications
Fundamental Research | Process Development | Equipment Design | Model Validation


General RF Power & Impedance

Determining the health of your RF process using our unique RF sensing platform


OCTIV

RF Sensing Platform

Features
Interchangeable Connectors | USB & RS232 Protocols | Multiple Frequency Ranges on One Unit | Wide Power Range

Applications
Power Metering | Match Network Characterisation | RF Subsystem Health | Process Monitoring