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App Note
Characterization of SiO2 pattern transfer in an ALE process using the Semion RFEA
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App Note
Ion energy and angular distributions measured in a planar Ar/O2 ICP using the Semion RFEA system
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App Note
Using Plasma Radio-Frequency Harmonic Emission for Clean Endpoint and Small Open Area Etch Endpoint Detection
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App Note
Determination of ion and neutral deposition rates using a quartz crystal microbalance and a gridded energy analyzer
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App Note
Measurement of deposition rates and ion energy distributions using the Quantum System
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App Note
Characterization of HiPIMS plasma via process compatible measurement probe
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App Note
Ion velocity distribution measurement through high-aspect ratio holes using the Semion system
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