App Note
Using Impedans Semion RFEA System to measure the effect of gas pressure on Ion Energy in a very-high frequency (VHF) magnetron sputtering discharge.
App Note
Analysis of 13.56 MHz and 40 MHz capacitively coupled nitrogen plasmas
App Note
Study of SiO2 sputter etch rate in RF-Biased ICP discharge.
The Pi-shaped Matching Network
The Pi-shaped Matching Network
The L-shaped Matching Network
The L-shaped Matching Network
Impedans
