Ion energy and angular distributions measured in a planar Ar/O2 ICP using the Semion RFEA system Post date March 30, 2023 ← Using Plasma Radio-Frequency Harmonic Emission for Clean Endpoint and Small Open Area Etch Endpoint Detection → Characterization of SiO2 pattern transfer in an ALE process using the Semion RFEA
ImpedansImpedansImpedans