Effect of substrate biasing on the ion properties of a magnetron sputtering system using Impedans’ Semion RFEA System and Octiv Suite 2.0 VI Probe Post date March 30, 2023 ← In-Orbit Demonstration of Novel Thruster, characterized by Impedans Semion Retarding Field Energy Analyzer → Design and characterization of a plasma chamber for improved radial and axial film uniformity using Impedans’ Langmuir probe system