Quantum Single Publications

Measurement of deposition rate and ion energy distribution in a pulsed dc magnetron sputtering system using a retarding field analyzer with embedded quartz crystal microbalance

Sharma S1, Gahan D2, Scullin P2, Doyle J2, Lennon J2, Vijayaraghavan RK1, Daniels S1, Hopkins MB2

1. Impedans Ltd, Chase House, City Junction Business Park, Northern Cross, Dublin 17, Ireland
2. National Centre for Plasma Science and Technology, Dublin City University, Dublin 9, Ireland

Published 04 April 2016


A compact retarding field analyzer with embedded quartz crystal microbalance has been developed to measure deposition rate, ionized flux fraction, and ion energy distribution arriving at the substrate location. The sensor can be placed on grounded, electrically floating, or radio frequency (rf) biased electrodes. A calibration method is presented to compensate for temperature effects in the quartz crystal. The metal deposition rate, metal ionization fraction, and energy distribution of the ions arriving at the substrate location are investigated in an asymmetric bipolar pulsed dc magnetron sputtering reactor under grounded, floating, and rf biased conditions. The diagnostic presented in this research work does not suffer from complications caused by water cooling arrangements to maintain constant temperature and is an attractive technique for characterizing a thin film deposition system.

View online at aip.scitation.org/doi/abs/10.1063/1.4946788