info@impedans.com 
ImpedansImpedansImpedans
Measure the key parameters of process performance; ion flux, ion energy distribution function, deposition rate and ion-neutral ratio.
The quantum system has an embedded quartz crystal microbalance that allows deposition rate to be monitored.
Our Langmuir probe systems are modular and can be quickly and easily installed on chambers with various flange options.
Our software, which can be installed on any PC or laptop, is very intuitive and user friendly.
Our RFEA sensors come with multiple substrate shapes and materials.
All of our systems come with replaceable sensing elements (button probes) which can be easily replaced when maintenance is needed.
The Quantum system is comprised of a retarding field energy analyser with integrated quartz crystal microbalance (QCM), used
to measure the ion energy distribution (IED) and the ion-neutral deposition ratio at a surface inside a plasma reactor. This system
measures and displays deposition rates, IED, ion flux and the DC bias voltage at the surface on which the sensor is deployed. Using
crystals coated with specified materials, the system can also measure etch rates of ions and neutrals. The system was designed to
be mounted on electrically biased surfaces including radio-frequency (RF). A unique shielding structure allows accurate detection
of the millivolt level, 6 MHz, crystal oscillation frequency in the presence of RF bias levels up to 900 V peak-to-peak. Unlike other
QCM systems, no water cooling of the crystals is needed. A compensation crystal, mounted next to the measurement crystal, is
not exposed to plasma particles and used to compensate for temperature effects on the oscillating frequency of the measurement
Measure the key parameters of process performance; ion flux, ion energy distribution function, deposition rate and aspect ratio.
Measure the parameters in real time, allowing you to make changes and monitor the effects live, saving hours of unnecessary setup and waiting.
The Quantum system is comprised of a retarding field energy analyzer with integrated quartz crystal microbalance (QCM), used to measure the ion energy distribution (IED) and the ion-neutral deposition ratio at a surface inside a plasma reactor.
This system measures and displays deposition rates, IED, ion flux and the DC bias voltage at the surface on which the sensor is deployed.
The Quantum provides insight for fundamental research and for plasma model validation.
Our RFEA systems are very easy to install in any plasma chamber. The system is small enough to be easily portable meaning a single system can be used in multiple chambers. It has an electrical feedthrough, a detachable holder substrate and replaceable sensors. the electrical feedthrough comes with a CF40 flange but we can also provide adapters to alternative flanges as needed.
Our software has been designed to be easy to use and can be installed on any laptop or PC.
Once installed the software allows the user to configure the system, run the scan, visualize the data and import/export data as needed.
The system will automatically calculate the IEDF results and in the case of a multi sensor Semion system the software will generate contour maps of energy and flux uniformity over the wafer area.
The sensing elements and holder substrates are available in anodised aluminium, bare aluminium or stainless-steel options.
We also have holder substrate options with up to 13 sensors integrated into a single holder allowing uniformity measurements.
Holders with different shapes and designs available upon request.
Our RFEA systems have a range of replaceable sensing elements with different signal sensitivities to probe a wide range of plasma ion current densities. They also allow for a range of pressures meaning a single system can be used for multiple plasma densities and pressure ranges.
The replaceable sensing elements can be purchased as a spare part and can be easily replaced by the user when maintenance is required.
Electronics Unit
Electrical Vacuum Feedthrough
Substrate Holder
Sensing Elements (Button probes)
| Part Number | Description | Current Range | |
|---|---|---|---|
|
02-0129-01 |
Quantum Electronics Unit |
Compatible for Quantum Holders |
|
|
02-0130-02 |
Quantum Feedthrough |
Compatible for Quantum Holders |
| Part Number | Description | Current Range | |
|---|---|---|---|
|
02-0132-01 |
100mm Holder |
1 Measurement Button, 1 Calibration Button |
|
|
02-0131-01 |
300mm Holder |
1 Measurement Button, 1 Calibration Button |
*Anodised Aluminium as standard. Bare Aluminium and Stainless-Steel available upon request.
| Part Number | Product Name | Description | |
|---|---|---|---|
|
02-0474-02 |
Low Density |
Ion Flux Range 0.001 to 3 Am-2 |
|
|
02-0133-01 |
Standard Density |
Ion Flux Range 0.01 to 50 Am-2 |
|
|
02-0477-01 |
High Density |
Ion Flux Range 0.1 to 700 Am-2 |
|
|
02-0134-01 |
Calibration Button |
Used as a temperature reference for the quartz crystal microbalance |
*Anodised Aluminium as standard. Bare Aluminium and Stainless-Steel available upon request.
