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Detect arcs that could be damaging your product and classify them into categories based on amplitude and duration.
Monitor ON-yime, pulse frequency and duty cycle of every pulse and report on deviations.
Our software, which can be installed on any PC or laptop, is very intuitive and user friendly.
Adjust the sensors settings automatically for complex multi step plasma processes.
Take a snapshot of events or at a dedicated time to check pulse shape.
The Alfven 100 is an advanced, all-in-one diagnostic instrument for plasma arc detection and RF pulse monitoring. The Alfven architecture enables real-time processing of RF measurements with one microsecond resolution. It is designed to detect and characterize arcs while simultaneously monitoring every RF pulse to check that each pulse is within a predefined specification. Arcs and misfiring RF pulses can lead to wafer defects, therefore, the Alfven 100 is an essential tool for rapid troubleshooting and 24/7 monitoring.
The sensor monitors and classifies the number of arcs per process, which can lead to undesirable particle creation, generating a summary report for the process.
The classification of the arcs is configurable within the software, allowing the user to set severity bands based on arc amplitude and duration.
The sensors have a 1 μs resolution for arcs (with adjustable noise filter).
The sensors monitor ON-time, pulse frequency and duty cycle of every pulse and works for ON-OFF and multi-level pulsing (up to 3 levels). The resolution of the sensors is 1 μs for atypical pulses (with adjustable noise filter).
Max., min. and average voltage and current are also reported
during pulses to monitor “overshoot”.
The sensors report on deviations from user configured
acceptance limits which can be configured in the software.
Our software has been designed to be easy to use and can be installed on any laptop or PC.
Once installed the software allows the user to configure the system, run the scan, visualize the data and import/export data as needed.
The sensors come with a recipe function which allows the user to instruct the sensor to adjust settings automatically to follow complex, multi-step plasma processes. This allows the sensors to be used for process where the pulse scheme changes during a single run.
The sensor comes with a snapshot feature which allows you to take a snapshot of any events but also to schedule snapshots so that you can periodically monitor the pulsing characteristics. This saves time and cost to set up directional coupler-to-oscilloscope measurements.
Quick Change
6mm Socket
20mm Socket
1 5/8 EIA
3 1/8 EIA
| Part Number | Frequency Range | Max Power | Max Voltage/Current | Connectors | |
|---|---|---|---|---|---|
|
02-0260-01 |
40kHz-121MHz |
1.5W - 12KW * |
1.85 kVpk / 9* ARMS |
Quick change** |
|
|
02-0496-01 |
40 kHz - 121 MHz |
1.5W - 12KW * |
1.85 kVpk/ 9* ARMS |
6mm Socket |
|
|
02-0498-01 |
400 kHz - 121 MHz |
1.5W - 12KW * |
19.8 kVpk-pk /120ARMS |
20mm Socket |
|
|
02-0497-01 |
400 kHz - 121 MHz |
1.5W - 12KW * |
22.6 kVpk-pk /120ARMS |
20mm Socket |
|
|
02-0499-01 |
400 kHz - 121 MHz |
3W - 30KW |
19.8 kVpk-pk /120ARMS |
EIA 1-5/8" |
|
|
02-0500-01 |
400 kHz - 121 MHz |
9W - 90KW |
33.9 kVpk-pk /500ARMS |
EIA 3-1/8" |
*Connector dependent, see our product datasheet for more information
** See our datasheet for a list of available quick change connectors
