Octiv Mono 2.0 | RF Wattmeter

Octiv Mono

RF Wattmeter & Impedance Analyzer- The New Industry Standard



The Octiv Mono is a through-line RF Wattmeter, directional power sensor and impedance analyzer. It measures a single fundamental frequency and it has a NIST traceable full scale accuracy of 1%.

It measures forward power, reflected power, absorbed power, VSWR and complex impedance. It connects directly to a PC via USB or over the network.

Features

  • Interchangeable Connectors
  • Wide Power Range
  • Multiple Frequency Calibration
  • Pulsed RF Functionality
  • Application

  • RF Subsystem Health Indexing
  • Match Network Characterization
  • Generator Output Verification
  • Transmission Line Mis-Match Identification
  • Overview

    The Octiv Mono is a precision RF Wattmeter used in a large number of laboratory applications. The Octiv Mono operates to 1% true accuracy and is immune to harmonics making it the most trusted power sensor for applications such as semiconductor manufacturing.

    The Octiv Mono is calibrated to five fundamental frequencies of your choice, for example:

    • 2MHz
    • 13.56MHz
    • 27.12MHz
    • 40.68MHz
    • 60MHz

    Each frequency can be selected via a drop down menu. The sensor has an output power range from 100 mW* to 12 kW*.
    *Customisable to your needs

    The rf wattmeter technology helps solve issues of poor production yields, tool matching and fault detection. It helps to define exact process windows and determines the health of power subsystems and determines 'process run to run' stability. It gives you the confidence to trust the accuracy of the most complex process input, RF power delivery.

    RF Parameters Measured

    • Real Power
    • Forward Power
    • Reflected Power
    • Impedance

    Measurement Functionality

    Time Averaged Measurements
    This provides an average over time of the RF power measurements required.

    Time Resolved Measurements
    This allows the user to synchronise measurements with an external synchronisation signal. The user can then obtain detailed information on the power distribution as a function of time or phase through the synchronisation pulse period. Typically the pulse period would be on a timescale of milliseconds to microseconds.

    Time Trend Measurements
    This allows the user to obtain information on the variation of power as time progresses through a particular process. This feature does not require external synchronisation and the timescales involved can be in range of seconds to hours.

    Smith Chart Measurements
    Monitor the Load Impedance as it is displayed on a Smith Chart and track Impedance variations throughout the process cycle.

    Octiv Mono wattmeter

    Features

    Probe

    Compact Design
    The Octiv Mono is designed to be compact and easy to install. It is mounted between the match unit and the generator to give the most accurate measurement of the RF delivery into the plasma chamber.

    Octiv Mono Pulsed Power Measurement
    The Octiv Mono measures the pulsed power time profile at micro second resolution while maintaining a very high degree of accuracy (1%). It measures a single frequency at a time and 15 of its harmonics. The user can select the frequency they wish to analyse from a drop down menu of 5 frequencies or the user can request 5 specific frequencies at the time of order.

    Meter View
    View process parameters as they are acquired by the sensor. This feature provides a useful way of monitoring RF power delivery during process hardware setup and installation. Data can be recorded to a file for analysis.

    Smith Chart View
    Monitor the Load Impedance as it is displayed on a Smith Chart and track Impedance variations throughout the process cycle.

    Time Trend View
    Use the Time Trend view to monitor each RF parameter in real-time. Visualise time-series data as it is acquired. Acquire an overview of each parameter during the process run and monitor run-to-run or chamber-to-chamber variations.

    Software

    Frequency Agility
    The Octiv Mono allows the user to accurately measure the RF parameters while tracking a rapidly varying fundamental frequency. For example: in variable frequency tuning to match the plasma.

    Software Application Programmers Interface (API)
    A comprehensive API is provided with the sensor to facilitate integration with 3rd party software applications. Sensor initialisation, configuration, and data transfer functions are easily implemented on all of the common software platforms.

    Communications Interface
    The standard Octiv communications interface is USB 2.0, which provides power to the sensor, and supports sensor configuration and data transfer activities in a laboratory environment. For integration with industrial equipment and manufacturing automation systems, alternative communications interfaces are available and based on RS-232 or Ethernet. Electrical isolation ensures the reliable transfer of data even in RF environments.

    Further Product Information

    Measuring Parameters

    Power Real (Watt) 200mW to 12 KW
    Power Forward (Watt) 200mW to 12 KW
    Power Reflected (Watt) 200mW to 12 KW
    Power Real (dBm) 25dBm to 70dBm
    Power Forward (dBm) 25dBm to 70dBm
    Power Reflected (dBm) 25dBm to 70dBm
    Impedance 1 to 500Ω

    Sensor Performance

    Accuracy ± 1% (at frequencies and power defined)
    Number of Frequencies 5 interchangable
    Frequency Range 350kHz to 100MHz
    Uniformity 2% Maximum
    Speed 10 Readings per Second
    Maximum Power 12kW
    Harmonic Interference No Limit (Within Power Range)
    Directivity 38dB
    Sensor Impedance 50 Ω

    Sensor Specifications

    Connectors All Standard Connectors Available
    Power Requirements USB or From Display Unit
    Dimensions 70mm x 70mm x 55mm
    Weight 400g
    Operating Temperature 0ºC to 35ºC
    Storage Temperature -40ºC to 80ºC
    Humidity 95% Max (non-condensing)
    Altitude 3000m
    Certification CE mark
    Calibration Cycle 12 Months

    Application Software

    Operating System Windows 2000 / XP / Vista / Windows 7 / Windows 8

    Operating Parameters

    Impedance 50Ω
    dBm 20dBm to 70dBm
    Power 10W to 10kW
    Power Frequency MF (350kHz to 1MHz) • RF (1MHz to 100MHz)

    The Octiv Mono used in RF Match Network Characterization applications

    Octiv Mono used in RF Match Network Characterization to measure match-unit range, efficiency, quality and internal resistance

    Abstract

    It is reported that a RF match network can have up to 50% power loss in a plasma process or any process with a RF power delivery system to a non-50ohm load causing variability within the process. In this document we discuss a novel method to characterize a matching network using two Octiv Monos

    Octiv Mono used in RF Matching Network Characterization.pdf

    Technical note

    OCTIV - Theory of Operation

    Abstract

    The Octiv VI probe is an advanced RF voltage and current sensor, which can provide real-time information on complex loads. Real-time information the Octiv provides includes voltage, current, phase, power and impedance on all harmonics of a chosen frequency simultaneously, as well as transmission line parameters such as forward power, reflected power, standing wave ratio (SWR) and reflection coefficient. The Octiv sensor was designed to meet the need for post-match voltage and current measurements in RF excited plasma processes.

    OC03: Octiv VI Probe - Theory of Operation

    OCTIV - Standards of Calibration

    Abstract

    High power radio-frequency (RF) voltage and current sensors need to be accurately calibrated to a traceable standard. Calibrating to high accuracy can be the most challenging aspect of high power, voltage-current sensor manufacture. This is due to the many sources of error in any calibration process. If the calibration is performed accurately and correctly, then most errors can be characterized and removed.

    OC04: Octiv VI Technology - Standards of Calibration

    Plasma Parameter Aspects in the Fabrication of Stable Amine Functionalized Plasma Polymer Films

    Carla Daunton, Louise E. Smith, Jason D. Whittle, Robert D. Short, David A. Steele and Andrew Michelmore

    Published 12th February 2015

    Abstract

    Amine containing plasma polymer films are of interest due to their ability to bind biomolecules either covalently or electrostatically. One issue with generating such plasma polymers is the need to generate sufficient amine density on the surface to enable binding, while simultaneously maintaining the chemical, physical stability of the surface in aqueous media. Here we investigate the relationship between plasma parameters, film stability for two commonly used monomers, allylamine AA, ethylenediamine EDA. Plasma polymer films from AA, EDA were produced at radio frequency RF powers between 2 and 20 W at a constant monomer flowrate. Deposition rate, ion flux, ion energy, plasma phase mass spectrometry were used to investigate the plasma-surface interactions. Film stability was assessed by comparing X-ray photoelectron spectroscopy XPS, atomic force microscopy AFM measurements before, after washing in phosphate buffered saline PBS. The results show that films generated from EDA plasmas are generally unstable in aqueous media, while films generated from AA plasmas exhibit higher stability, particularly those deposited at high RF power. The chemical, physical stability of the films is then related to the mechanisms of deposition, the energy density provided to the surface during film growth.

    Online at Plasma Process. Polym. 2015, 12, 817–826 DOI: 10.1002/ppap.201400215


    An Experimental and Analytical Study of an Asymmetric Capacitively Coupled Plasma Used for Plasma Polymerization

    Andrew Michelmore, Jason D. Whittle, Robert D. Short, Rod W. Boswell, Christine Charles

    Published 4th June 2014

    Abstract

    Plasma processing is widely used to provide novel surface modifications to materials for a variety of
    applications. Typically, the systems used to carry out these modifications are poorly characterised. Here we describe the basics of a global model for a capacitively coupled asymmetric parallel plate radiofrequency plasma system routinely used to produce plasma polymers. An analytical global model was developed for argon, for which cross-sections are known, at a constant pressure of 1 Pa, and includes an electrical model and a power balance. The main parameters of interest were ion flux and self-bias voltages. The argon modelling results were then compared to experimental results for a range of operating gases (argon, oxygen, amines, acids, alcohols, ethers, siloxanes) including both saturated and unsaturated compounds with molecular weights ranging from 40 to 162 g mol1, for different inter-electrode separations and from 2 to 50 W using an Impedans OctIV probe. Importantly, it is shown that the RF power transfer efficiency is dependent on the gas. The results show that the argon model results can be used to predict the plasma parameters for other gases when the RF power transfer efficiency is taken into account.

    Online at Plasma Process. Polym. 2014, 11, 833–841 DOI: 10.1002/ppap.201400026


    Octiv Mono set-up

    Operational video showing the quick and easy set-up of the Octiv Mono within it's application


    Try out our latest Octiv software and sample data of a match-unit characterized

    Match Unit Characterization files
    Mono 1 non 50ohm data file
    Mono 2 50ohm load data file

    Application Note
    Octiv Mono used in RF Match Network Characterization to measure match-unit range, efficiency, quality and internal resistance

    RF Matching Network Characterization using two Octiv Monos

    Operational video showing the quick and easy steps to characterize a RF impedance match unit


    A word from our clients

    "Impedans provides unique products, timely support, and always welcome customer’s feedback to further improve their product. It is a delight to work with Impedans’ development team"