| The Langmuir Probe System used in different applications |
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Impedans' Langmuir Probe System is used by academia and industry globally for plasma characterisation. Below is a list of publications with their plasma sources, process gases, pressures and applications. There are over 130 publications now available in total, watch this space for the complete list. |
| The Langmuir Spatial Probe used in Dusty Plasma applications |
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Langmuir Probe used in an RF Dusty Plasma to measure the dust charge and densityAbstractIt is reported that 50 per cent of the failure in semiconductor production is due to dust particle contamination in plasma processes such as plasma etching. This study aimed to develop a method for measuring the density and charges of dust particles in a capacitive coupled cylinder discharge chamber in mixtures of gases SiH4 / C2H4 / Ar. A Langmuir probe was employed to gain such parameters as electron density and ion density of the dusty plasma.
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| The Langmuir Spatial Probe used in Plasma Etching applications |
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End-point detection of polymer etching using Langmuir ProbesAbstractDetermining accurately the end point of a plasma-etching process is extremely important for integrated circuit fabrication, as overetching can result in the removal of part of the film, or substrate lying under the film to be etched, and/or in extra undercut of the film. End-point detection is traditionally performed using several different techniques including the four most common techniques: measurement of the DC self-bias voltage, mass spectrometry, emission spectrometry, and interferometry.
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Langmuir Probe used in experimental and numerical investigations of the phase-shift effect in capacitively coupled dischargesAbstractIn this study, the authors have used a Langmuir Probe to measure the electron density and the electron energy distribution function in phase-shift controlled capacitively coupled plasmas. To verify the experimental results, a 2D fluid model was also used to calculate the electron densities at various phase differences. |
| The Langmuir Spatial Probe used in HiPIMS Plasma applications |
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Plasma diagnostics of low-pressure high-power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasmaAbstractThe study focused on the plasma measurement of parameters to explore the assistance of the electron cyclotron wave resonance (ECWR) on the evolution of HiPIMS discharge, where it has several benefits.
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Langmuir Single Probe used in determining the temporal evolution of negative ion density in the afterglow of reactive HiPIMS of titanium in an argon/oxygen gas mixtureAbstractThis study used a Langmuir Single Probe to determine the temporal evolution of the oxygen negative ion and electron densities during the offtime of a reactive HiPIMS discharge operating in argon–oxygen gas mixtures. The aim of the study was to add to the knowledge base information about oxygen negative ion dynamics that will help many plasma processing methods. |
| The Langmuir Spatial Probe used in PECVD applications |
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A study of plasma parameters in a BAI 730 M triode ion plating system by means of a Langmuir probe and plasma mass and energy spectroscopyAbstractPlasma-assisted processes are widely used in various areas of modern manufacturing, including physical vapour deposited (PVD) hard coatings, and there is an ongoing need for characterisation of plasma parameters. Beside the conventional Langmuir probe technique, plasma spectroscopy is being more and more widely used. This paper compares the results obtained by the Langmuir plasma probe with the results of energy and mass resolved plasma spectroscopy during three modes of operation (heating, etching, deposition) in a commercial triode ion plating system (Blazers BAI 730 M) used to deposit hard coatings like TiN, CrN and Ti(C,N). |
| The Langmuir Spatial Probe used in Space Plasma applications |
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Langmuir probe used in a lunar dust application to measure the electron density and energy distributionAbstractThe single Langmuir probe is ideal for measuring and understanding the nature of the photoelectron plasma environment above a VUV illuminated surface. It is this photoelectron plasma region that provides the local environment for dust particles in a lunar environment. |
Hall Effect Thruster plasma plume characterization with probe measurements and self-similar fluid modelsAbstractHall effect thrusters (HET) are currently recognized as a good propulsion means for long missions and moves that require large velocity increments. The plasma plume of a HET exhibits a relatively large divergence angle of about 45°, and investigating this plume and its expansion into space is vital for understanding these devices and assessing the mechanical and electrical interactions of the exhaust plasma plume with the spacecraft itself and the surrounding environment. |
| The Langmuir Spatial Probe used in Plasma Sputtering applications |
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Observation of two-temperature electrons in a sputtering magnetron plasmaAbstractUnderstanding electron transport in sputtering magnetrons is essential for the understanding of the operation of these devices, which are used for sputter etching and thin-film deposition. Several recent experiments have used Langmuir probes to investigate the electron component of a magnetron plasma and mechanisms of electron transport. For instance, Rossnagel and Kaufman reported that the electron temperature and density decrease with distance from the cathode, and noted the presence of a high-temperature electron tail under certain conditions, such as in a He discharge.
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Time-resolved plasma characterisation of modulated pulsed power magnetron sputtering using a Langmuir probeAbstractWith the knowledge that no investigation of certain key parameters of the plasma during Modulated Pulse Power Magnetron Sputtering (MPPMS) has yet been published, in this study, the authors employed a Langmuir probe to measure temporally resolved electron density, ion density, electron temperature, floating potential and plasma potential during the process. |
LP16: Langmiur Applications List