Innovation of technology is growing at an unprecedented rate. Big data, IoTs and automation are the key drivers in our industry.
Is your business ready for the next iteration?
Not to worry, with our integrated sensors and technology, your business will have a bright future.
Our versatile plasma measurement tools adapt to any environment: R & D and Industry
Measurements include:
Features
- Single & Double Probe Combined
- Advanced RF Compensation
- High Speed Acqusition
Applications
- Fundamental Research
- Process Development
- Equipment Design
- Model Validation
Features
- Substrate Bias Compatible
- High RF Bias Resistant
- Easily Installed
- High Temperature Resistant
Applications
- Process Parameters Correlation with Process Outcome
- Process Uniformity
- Process Development
- Equipment Design
Features
- Substrate Bias Compatible
- High RF Bias Resistant
- Easily Installed
- High Temperature Resistant
- No Cooling Required
Applications
- Ion-Neutral Deposition Rate Mapping
- Process Uniformity
- Process Development
- Equipment Design