Plasma measurement is evolving
Are you ready for it?
Innovation of technology is growing at an unprecedented rate. Big data, IoTs and automation are the key drivers in our industry.
Is your business ready for the next iteration?
Not to worry, with our integrated sensors and technology, your business will have a bright future.
Our versatile plasma measurement tools adapt to any environment: R & D and Industry
Measurements include:
- Uniformity
- Ion Energy
- Plasma Density
Contact a Plasma Specialist
Langmuir ProbePlasma Volume Characterization

Features
- Single & Double Probe Combined
- Advanced RF Compensation
- High Speed Acqusition
Applications
- Fundamental Research
- Process Development
- Equipment Design
- Model Validation
Semion SystemIon Energy, Ion Flux and Uniformity Analysis
Features
- Substrate Bias Compatible
- High RF Bias Resistant
- Easily Installed
- High Temperature Resistant
Applications
- Process Parameters Correlation with Process Outcome
- Process Uniformity
- Process Development
- Equipment Design
Quantum SystemIon-Nuetral Deposition Rate Monitor

Features
- Substrate Bias Compatible
- High RF Bias Resistant
- Easily Installed
- High Temperature Resistant
- No Cooling Required
Applications
- Ion-Neutral Deposition Rate Mapping
- Process Uniformity
- Process Development
- Equipment Design
We look forward to assisting you with your plasma measurement needs