Categories Application Notes Process Performance Semion 2500 V4 Ion flux and energy measurement using Impedans Semion system in silicon etching with a pulsed HBr/O2 plasma. Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Fundamental Research Langmuir Probe Experimental investigations on time resolved characteristics of pulsed inductively coupled O2 /Ar plasmas using Impedans Langmuir Probe. Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Fundamental Research Langmuir Probe Octiv Poly 2.0 Tool Characterization Application of Impedans Langmuir Probe and Octiv Poly in ICP argon discharge to study electron kinetics and spatial transport Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Fundamental Research Langmuir Probe Octiv Suite 2.0 AImpedans Langmuir Probe and Octiv Suite are used to study the time dependencies of pulsed inductively coupled Ar and Ar/CF4 discharges Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Fundamental Research Langmuir Probe Impedans Langmuir Probe is used to measure the negative ions in an electro-negative plasma Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Process Performance Vertex Ion energy and ion flux measurements through high-aspect ratio holes using the Vertex system Post author By Sean Mulcahy Post date October 20, 2022
Categories Plato Probe Tool Characterization Characterization of HiPIMS plasma via process compatible measurement probe Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Process Performance Quantum Measurement of deposition rates and ion energy distributions using the Quantum System Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Moduli RF Spectrometer Octiv Poly 2.0 Octiv Suite 2.0 Process End Point Detection Application of the Impedans Moduli RF Spectrometer for Detecting Clean and Small Open Area Etch Endpoints through RF Harmonic Emission from Plasma Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Model Validation Semion 2500 V4 Ion energy and angular distributions measured in a planar Ar/O2 ICP using the Semion RFEA system Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Process Performance Semion 2500 V4 Tool Characterization Characterization of SiO2 pattern transfer in an ALE process using the Semion RFEA Post author By Sean Mulcahy Post date October 5, 2022
Categories Application Notes Semion 2500 V4 Tool Characterization Ion energy measurements of ions emitted by a mini-helicon thruster using Semion retarding field energy analyzer Post author By Sean Mulcahy Post date October 5, 2022
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