Categories Application Notes Applications Fundamental Research Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 Process Performance Bias potential measurement with Octiv VI probe during atomic layer etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers Post author By nadia lobo Post date November 1, 2023
Categories Application Notes Applications Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 RF Match unit Characterization Utilizing Impedans Octiv VI Probes for Characterization of RF Matching Networks Post author By Sean Mulcahy Post date March 6, 2023
Categories Application Notes Octiv Suite 2.0 Process Performance Semion 2500 V4 Effect of substrate biasing on the ion properties of a magnetron sputtering system using Impedans’ Semion RFEA System and Octiv Suite 2.0 VI Probe Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 Semion 2500 V4 Tool Characterization Measurements of plasma produced by Inductively coupled array (INCA) with Impedans’ Langmuir Probe, Semion RFEA System and Octiv VI Probe Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Model Validation Octiv Suite 2.0 Measurement of DC self bias and Ion flux using Impedans Octiv VI probe during plasma polymerization process in an asymmetric capacitively coupled plasma Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Fundamental Research Octiv Suite 2.0 Semion 2500 V4 Tool Characterization The magnetic asymmetry effect in geometrically asymmetric RF capacitively coupled plasmas, characterized with Impedans’ Octiv Suite 2.0 VI probe and Semion RFEA system Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Fundamental Research Langmuir Probe Octiv Suite 2.0 AImpedans Langmuir Probe and Octiv Suite are used to study the time dependencies of pulsed inductively coupled Ar and Ar/CF4 discharges Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Moduli RF Spectrometer Octiv Poly 2.0 Octiv Suite 2.0 Process End Point Detection Application of the Impedans Moduli RF Spectrometer for Detecting Clean and Small Open Area Etch Endpoints through RF Harmonic Emission from Plasma Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Octiv Suite 2.0 Ion flux measurements using Octiv VI probe in RF Plasma Polymerisation of Furfuryl Methacrylate (FMA) Post author By Sean Mulcahy Post date October 5, 2022
Categories Application Notes Octiv Suite 2.0 Ion flux measurements using Octiv VI Probe to study the deposition rates in plasma polymerization process Post author By Sean Mulcahy Post date October 5, 2022
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