Categories Application Notes Applications Fundamental Research Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 Process Performance Bias potential measurement with Octiv VI probe during atomic layer etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers Post author By nadia lobo Post date November 1, 2023
Categories Application Notes Langmuir Probe Model Validation Process Performance Semion 2500 V4 Impedans’ Semion and Langmuir Probe systems used to study the SiO2 sputter etch rate in RF-Biased ICP discharge Post author By Sean Mulcahy Post date December 2, 2022
Categories Application Notes Process Performance Semion 2500 V4 Semion retarding field energy analyzer used to investigate reactive HiPIMS + MF sputtering of TiO2 crystalline thin films Post author By Riyazul Mohamed Post date October 20, 2022
Categories Application Notes Langmuir Probe Process Performance Semion 2500 V4 Semion 3KV Semion pDC Semion RFEA used for Ion energy distribution measurements in RF and pulsed DC plasma discharges Post author By Riyazul Mohamed Post date October 20, 2022
Categories Application Notes Process Performance Semion 2500 V4 Using Impedans Semion RFEA System to measure the effect of gas pressure on Ion Energy in a very-high frequency (VHF) magnetron sputtering discharge. Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Octiv Suite 2.0 Process Performance Semion 2500 V4 Effect of substrate biasing on the ion properties of a magnetron sputtering system using Impedans’ Semion RFEA System and Octiv Suite 2.0 VI Probe Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Process Performance Semion 2500 V4 The effect of driving frequency on the IVDF in a magnetron sputtering system using Impedans’ Semion RFEA System Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Process Performance Vertex Ion angular distribution measurement with a planar retarding field analyzer Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Process Performance Semion 2500 V4 Ion flux and energy measurement using Impedans Semion system in silicon etching with a pulsed HBr/O2 plasma. Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Process Performance Ion velocity distribution measurement through high-aspect ratio holes using the Semion system Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Process Performance Vertex Ion energy and ion flux measurements through high-aspect ratio holes using the Vertex system Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Process Performance Quantum Measurement of deposition rates and ion energy distributions using the Quantum System Post author By Sean Mulcahy Post date October 20, 2022
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