Categories Application Notes Process Performance Vertex Ion energy and ion flux measurements through high-aspect ratio holes using the Vertex system Post author By Sean Mulcahy Post date October 20, 2022
Categories Plato Probe Tool Characterization Characterization of HiPIMS plasma via process compatible measurement probe Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Process Performance Quantum Measurement of deposition rates and ion energy distributions using the Quantum System Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Moduli RF Spectrometer Octiv Poly 2.0 Octiv Suite 2.0 Process End Point Detection Application of the Impedans Moduli RF Spectrometer for Detecting Clean and Small Open Area Etch Endpoints through RF Harmonic Emission from Plasma Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Model Validation Semion 2500 V4 Ion energy and angular distributions measured in a planar Ar/O2 ICP using the Semion RFEA system Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Process Performance Semion 2500 V4 Tool Characterization Characterization of SiO2 pattern transfer in an ALE process using the Semion RFEA Post author By Sean Mulcahy Post date October 5, 2022
Categories Application Notes Semion 2500 V4 Tool Characterization Ion energy measurements of ions emitted by a mini-helicon thruster using Semion retarding field energy analyzer Post author By Sean Mulcahy Post date October 5, 2022
Categories Fundamental Research Process Performance Process Transfer Quantum Semion 2500 Semion 2500 V4 Semion 3KV Semion pDC Tool Characterization Vertex Measuring Ion Velocity Distributions and Ion Energy Distributions using Retarding Field Energy Analysers (RFEAs) Post author By Sean Mulcahy Post date October 5, 2022
Categories Application Notes Semion 2500 V4 Tool Characterization Ion energy measurements using Semion RFEA in a dual-high power impulse magnetron sputtering Post author By Sean Mulcahy Post date October 5, 2022
Categories Application Notes Process Performance Semion 2500 V4 Time resolved measurements of IEDF using Semion RFEA in dual HIPIMS for Ti-Cu thin film deposition Post author By Sean Mulcahy Post date October 5, 2022
Categories Application Notes Octiv Poly 2.0 virtual metrology Octiv VI probe used to measure the RF characteristics of a commercial CCP reactor Post author By Sean Mulcahy Post date October 5, 2022
Categories Application Notes Octiv Poly 2.0 Tool Characterization Electrical characterization of a RF powered micro atmospheric pressure plasma jet using Octiv VI probe Post author By Sean Mulcahy Post date October 5, 2022
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