Categories Application Notes Applications Ion beam assisted chemical vapor deposition of hybrid coating – Process diagnostics and mechanisms using Impedans Plato Probe Post author By nadia lobo Post date January 15, 2024
Categories Application Notes Applications Ion energy distribution measurements with Impedans Semion RFEA in Si -ALE using Cl2 Post author By nadia lobo Post date December 12, 2023
Categories Application Notes Applications Evaluation of Plasma Parameters Using the Impedans Langmuir Probe in HiPIMS and DCMS Systems Post author By nadia lobo Post date November 15, 2023
Categories Application Notes Applications Plasma Characterization in a Laser-Plasma Hybrid Welding System Using the Impedans Langmuir Double Probe Post author By nadia lobo Post date November 2, 2023
Categories Application Notes Applications Impedans Semion RFEA used for Ion energy measurements in Asynchronously Pulsed Plasma during High Aspect Ratio Nanoscale Si Trench Etching Post author By nadia lobo Post date November 2, 2023
Categories Application Notes Applications Fundamental Research Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 Process Performance Bias potential measurement with Octiv VI probe during atomic layer etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers Post author By nadia lobo Post date November 1, 2023
Categories Application Notes Applications Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 RF Match unit Characterization Utilizing Impedans Octiv VI Probes for Characterization of RF Matching Networks Post author By Sean Mulcahy Post date March 6, 2023
Categories Application Notes RF Match unit Characterization RF Matchbox Characterization using Impedans Octiv VI Probes Post author By Sean Mulcahy Post date December 15, 2022
Categories Application Notes Langmuir Probe Model Validation Process Performance Semion 2500 V4 Impedans’ Semion and Langmuir Probe systems used to study the SiO2 sputter etch rate in RF-Biased ICP discharge Post author By Sean Mulcahy Post date December 2, 2022
Categories Application Notes Fundamental Research Langmuir Probe Tool Characterization Impedans Langmuir Probe used to analyse 13.56 MHz and 40 MHz capacitively coupled nitrogen plasmas Post author By Sean Mulcahy Post date December 2, 2022
Categories Application Notes Fundamental Research Langmuir Probe Langmuir probe used in a lunar dust application to measure the electron density and energy distribution Post author By Riyazul Mohamed Post date October 20, 2022
Categories Application Notes Process Performance Semion 2500 V4 Semion retarding field energy analyzer used to investigate reactive HiPIMS + MF sputtering of TiO2 crystalline thin films Post author By Riyazul Mohamed Post date October 20, 2022
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