Octiv VI Probe Application Note

Plasma polymerization offers a favourable method for coating surfaces with thin films of specific chemical functionality such as aldehydes, carboxylic acids, alcohols, etc. These coatings enable materials to be used for a variety of applications ranging from biomaterials, polymer grafting, and nanoparticle at- tachment. Inorganic phosphate coatings have been used previously for corrosion prevention, mineral dispersion and rheological modification.

We Are Impedans Series - Production Manager, David Finlay

In our sixth We Are Impedans series, we chat with our Production Manager, David Finlay. In this edition David shares his passion for Electronic Engineering and how he enjoys his work at Impedans.

Octiv VI Probe Application Note

Capacitively coupled plasma (CCP) reactors are used in a wide range of plasma processing applications. The physical processes that control the fundamental plasma properties are still not fully understood.

We Are Impedans Series - Embedded Engineer, Mike O'Keeffe

In our fifth We Are Impedans series, we chat with our Embedded Engineer, Mike O'Keeffe. In this edition Mike shares his passion for Electronic Engineering and how he enjoys his work at Impedans.

Moduli | RF Spectrometer

RF Spectrometer Non Invasive Fault Detection

The RF Spectrometer has arrived

The RF Spectrometer is a non-invasive plasma sensor that works by analyzing the RF emitted by the plasma through a view port. This is designed for fault detection on production tools without the need for an in-line sensor in the RF path. It has been proven to detect air leaks, wafer displacement and other serious plasma faults.

Langmuir Probe studied in EEPF Characteristics

RF inductively coupled hydrogen plasmas have many applications including plasma etching for semiconductor processing and neutral beam generation for fusion experiments. A better understanding of the physical processes that govern the hydrogen plasma properties will enable better plasma control. In this study, the authors investigate the characteristics of the electron energy probability function (EEPF) in an expanding, hydrogen, inductively coupled plasma powered separately at 2 MHz and 13.56 MHz.

Semion RFEA and Langmuir Probe Application Note

Inductively coupled plasmas (ICPs) with radiofrequency (RF) biased pedestals are commonly used in the semiconductor industry for nanoscale etch and deposition processes. In this study, the authors investigate the sputter etch rate of SiO2 in this type of reactor as a function of ICP and RF-bias power. The key parameters measured were the ion energy distribution (IED), ion flux and sputter etch rate.

Industry 4.0 Resource List in 2019

Industry 4.0 Resource List

Industry 4.0 Resource List

To help you start off on the right foot, we've gathered some valuable insights relating to Industry 4.0 and Smart Manufacturing.

But first, what is Industry 4.0?

We Are Impedans Series - Head of Sales, Chanel Linnane

In our fourth We Are Impedans series, we chat with our Head of Sales, Chanel Linnane. In this edition Chanel shares her passion for plasma physics and why she left industry to join Impedans to become the Head of Global Sales.

We Are Impedans Series - JJ Lennon, COO

In our third We Are Impedans series, we chat with our COO, JJ Lennon. In this edition JJ shares his journey from starting off as a mechanical engineer to becoming the Chief Operations Officer.

Is Fusion Plasma Research The Answer To Space Travel?

14th Space X launch - Space Thrusters
Plasma thrusters have the potential to revolutionise the aerospace industry for the better. But how? Plasma thrusters offer the best technology solution for space travel by using plasma beams instead of ion sources.

We Are Impedans series - Andy Correa, Full Stack Developer

In our second We Are Impedans series, we chat with our full stack developer, Andy Correa. In this edition you will read about an ex pâtissier who put up his chef hat for the glamorous life of a coder.

We Are Impedans Series - Panos Iosifidis

Welcome to the first interview with our software engineer, Panos Iosifidis, in our We Are Impedans Series. In this series you will find out about the talent behind the Impedans name from our software engineers to our scientists. To get us started, Panos describes his experience so far.

Mayor’s office of China’s Silicon Valley interrogates Irish high technology Company.

The deputy district mayor of Shenzhen, Liu Zhiyong and a delegation from the Shenzhen Financial Development Office meeting the Management Team at Impedans Ltd.
Deputy District Mayor Liu Zhiyong, PhD, of Shenzhen (also known as China’s hardware Silicon Valley) at a meeting today in Dublin with Irish technology company Impedans Ltd. The Deputy Mayor is chasing high quality technology companies to establish in Shenzhen, which has grown from a population of 300,000 to over 13 million people in the last three decades.

Interview with SOSV General Partner, Bill Liao

Bill Liao

From its inception in 2004, Impedans has had a vision to put intelligent sensors on every plasma processing tool to measure what is often thought impossible i.e. the complex characteristics of the plasma state of matter used for surface modification. Find out what Bill has to say about the industry and Impedans.

How to identify vital signs of a plasma process

Exclusive blog on Plasma Health

The human body is extraordinarily complex. Our physical and mental performance is dependent on the health and fitness of our major organs. As long as we keep our vital organs in good condition, we can work with optimum efficiency. We generally know how well our bodies are functioning. Occasionally, we feel under the weather and we may consult a GP for a diagnosis. The GP will want to check some or all of your vital signs; pulse rate, body temperature, respiration rate and blood pressure.

Admittedly, I am no GP, but I find an interesting analogy between the health of the human body and that of a plasma processing tool! Lets look at the vital signs with this analogy in mind.

Pulse rate and pulse shape (ECG) are critical indicators of our cardiovascular health. The heart really is the bodies main power supply. Modern plasma processes are also driven by pulsed RF power supplies. Just like the human body, the pulse rate and pulse shape are critical parameters to be monitored to determine the stability of the plasma process.

Click to read more

SVC TechCon2018

We are excited to announce our attendance at the 61st Annual Technical Conference at SVC TechCon 2018. This year we are looking forward to the latest innovations and trends in the vacuum coating industry. Come join us at booth 433 as it's an event not to miss.
#TechCon2018 #vacuumcoating #coatingtechnologies #measuringtheimpossible

The Journey: How plasma measurement became the cornerstone of Impedans

The evolution of plasma measurement tools
Scientists just assumed that plasma measurement was impossible, or at least unreliable, so forget it. The Scientific Community decided to solve this problem by producing a standard plasma chamber for experimental measurements and using reliable measurement of input parameters. We can call this the recipe based, copy exact approach. Back in 1990, my problem with this approach was that I was based in a laboratory in Ireland which had very poor research funding and I found it prohibitively expensive to reproduce the standard chamber. Click to read more...

Spring Series Case Study

Medical Device Manufacturing Case Study

Medical Device Manufacturing Case Study

How does a plasma measurement company contribute to a $400 billion medical device industry? Learn how Impedans improves the overall process of RF measurement to reduce product scrap in an industry that prevents, diagnoses and treats diseases and illnesses.

Plasma processing is used extensively in medical device manufacturing. Applications include the modifcation of surfaces (to improve adhesion or reduce friction), sterilization and bio-compatible coatings for implants. Impedans have assisted several multinational medical device manufacturers to implement plasma measurement solutions to improve process performance and reduce product scrap. We have developed several applications to detect RF related issues, such as arcing and equipment malfunction, which lead to poor tool performance and reduction in product yield. The main applications can be summarised as follows >>

New: Impedans TV | The Octiv™ Range

Impedans TV

Impedan's TV: The OCTIV™ | RANGE

For our latest video series we're shining a spotlight on our line of next generation RF sensors: The Octiv™ Range. In July we launched Octiv 2.0: a significant upgrade to the Octiv™ product range which provides a major improvement in performance in non-50 ohm environments. To achieve this, the calibration method has been redesigned and improved. Therefore, it is classified as a new product and existing Octiv™ models will be phased out. Existing Octiv™ customers, with compatible models, will be automatically upgraded to Octiv™ 2.0 during the next scheduled calibration.

To celebrate this, Impedans TV has produced a series of videos covering the Octiv hardware, software and demonstrating its abilities in frequency agility, waveform reconstruction and pulsed profile. Check out the first installment below and find the following parts at Impedans TV.

Introducing Impedans Case Study Series

Introducing Impedans Case Study Series

Case Study 1 - NASDAQ 100 Company Reduces Production Costs with Octiv VI Probe Technology

The first in our case Study Series examines how Impedans RF and Mechanical design teams aided a NASDAQ 100 Technology company, who needed to improve the performance and extend the lifetime of an aging fleet of plasma etching tools. Through the integration of Impedans Octiv Sensing Platform, this long-time Impedans client was able to reduce production costs and increase product throughput dramatically, and thus make substantial savings, directly as a result.

Introducing the Alfven | 100 RF Event Detector

Alvfen | 100 RF Event Detector from Impedans, prevent product scrap, reduce cost, detect arc events, network enabled

Impedans are proud to introduce the Alfven | 100 RF Event Detector.

The Alfven | 100™ RF Event Detector is designed to monitor short-lived, unexpected events in RF and plasma processes, that can cause product scrappage and significant cost to the manufacturer. 
Plasma processes, in semiconductor (and related industries), such as plasma etching, PVD and PECVD are susceptible to events such as arcs, instabilities and ignition phenomena. The Alfven | 100™ will detect these events and send real-time warnings to the operator to enable corrective action. 

More information can be found on the product page.


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