News

In this paper, the authors demonstrate a simple radio-frequency (RF) power-coupling scheme for a micro atmospheric pressure plasma jet (μAPPJ) based on a series LC resonance, with the discharge gap being part of the resonant element. The Impedans Octiv was used in the experiment. Click here to download and read.

Today's application note introduces a hybrid-dual-HiPIMS system based on the simultaneous combination of dual-HiPIMS and MF discharges. The main body of the study is the time-resolved diagnostics taken using a Semion System during the deposition of Ti–Cu films, revealing the degree of assistance made by the MF discharge. Click here to download and read.

This study used a Langmuir Single Probe to determine the temporal evolution of the oxygen negative ion and electron densities during the offtime of a reactive HiPIMS discharge operating in argon–oxygen gas mixtures. The aim of the study was to add to the knowledge base information about oxygen negative ion dynamics that will help many plasma processing methods. Click here to download and read.

High-power impulse magnetron sputtering (HiPIMS) systems have been previously studied with mid-frequency (MF) plasma excitation, utilizing the “off” period to enhance the deposition rate, decrease the working pressure, and improve HiPIMS plasma generation. Our latest application note looks at the time-resolved ion velocity distribution function (IVDF) in a high-power pulse plasma in three modes of excitation: pure HiPIMS, medium-frequency pulsed bipolar (MF 350 kHz) and hybrid pulsed HiPIMS + MF. Click here to download and read.

Click the video below to see Impedans unique and easy method for switching between single and double Langmuir Probe tips

Click here to explore more about our Langmuir Probe.

Some manufacturing considerations for parameter estimation in pulsed plasma discharges

Stephen Daniels | Dublin City University

Click here to see more from the Pulsed Plasma Diagnostic Workshop.

Click to read the new Theory of Operation for our Semion System. This highly versatile instrument measures ion energy, ion flux, negative ions, temperature and bias voltage at any location inside a plasma reactor, even at the substrate position. The multi-sensor version can also be used to look at uniformity issues that are very common in plasma processes. This gives valuable and unique data to many industries including etching, deposition, ion beam and space plasma.

Investigation of HiPIMS Discharges

Ralph Bandorf | Fraunhofer IST

Click here to see more from the Pulsed Plasma Diagnostic Workshop.

Elementary surface processes during plasma pre-treatment of polymers and during target poisoning in reactive magnetron sputtering

Carles Corbella | RWTH Aachen University

Click here to see more from the Pulsed Plasma Diagnostic Workshop.

Click to read our new Langmuir Probe Theory of Operation that outlines the unique features and functions of our system for characterising bulk plasma parameters. You can also download a PDF for offline viewing and reference.

Plasma diagnostic challenges in the High Power Impulse Magnetron Sputtering (HiPIMS) environment

Arutiun P Ehiasarian | Sheffield Hallam University

Click here to see more from the Pulsed Plasma Diagnostic Workshop.

Time-resolved diagnostic of assisted HIgh Power Impulse Magnetron Sputtering (HiPIMS) discharges in wide pressure-ranges

Vitezslav Stranak | University of Greifswald

Click here to see more from the Pulsed Plasma Diagnostic Workshop.

Our latest instrument catalogue is now available for download and offline viewing. Click here to get your copy.

The 2014 MRS Fall Meeting and Exhibit is on in Boston, Massachusetts between November 30 - December 5. Impedans will be exhibiting at booth 508 and we look forward to speaking to you there. Visit our blog http://bit.ly/17L1NvK to catch up on Impedans news.

Measurements and modelling of kinetics in pulsed plasmas

Jakob Barz | University of Stuttgart

Click here to see more from the Pulsed Plasma Diagnostic Workshop.

We are very pleased to announce that Impedans have achieved 3rd place in the Deloitte Technology Fast 50 Awards held in Dublin last Friday with a company growth rate of 881%. Congratulations to all entrants and thanks to Deloitte for hosting this great event.

Click 'Read More' to see an abstract of Shailesh Sharma’s upcoming talk at AVS 61 in Baltimore, Maryland. He will be speaking about Ion Angular Distributions Measured with a Planar Retarding Field Analyser on Wednesday at 4.20pm. This talk will highlight advances in RFA technology, one of the most important fields of plasma diagnostics.

AVS International Symposium and Exhibition is on in Baltimore between November 9 - 14. We will be exhibiting there and our own Shailesh Sharma will be giving a talk on Ion Angular Distributions Measured with a Planar Retarding Field Analyser. We look forward to hearing Shailesh and seeing you at booth 1502.

Click 'Read More' to read Shailesh's Abstract.