Moduli Application Note

Using Plasma Radio-Frequency Harmonic Emission for Clean Endpoint and Small Open Area Etch Endpoint Detection. Read more..

Langmuir Probe Application Note

Learn how the authors have conducted numerical and experimental diagnostics of dusty plasma in a coaxial gridded hollow cathode discharge.

We Are Impedans Series - Marketing Executive, Riyazul A. Mohamed

In the next post in the We Are Impedans series, we chat with our Marketing Executive, Riyazul A. Mohamed. In this edition Riyazul shares his passion for marketing and how he enjoys his work at Impedans.

Octiv VI Probe Application Note

Learn how the authors have investigated the relationship between the plasma phase of furfuryl methacrylate (FMA) and the surface chemistry of the generated plasma coatings utilising mass spectrometry.

We Are Impedans Series - Production technician, Colin Curran

In the next post in the We Are Impedans series, we chat with our Production technician, Colin Curran. In this edition Colin shares his passion and how he enjoys his work at Impedans.

Semion RFEA Application Note - SE10

Learn how the authors have designed a novel helicon plasma thruster for space propulsion applications. The thruster was characterised in terms of Specific Impulse using a retarding field energy analyser. Specific Impulse levels as high as existing techniques have been achieved at much lower bias.

Making our world a better place!

We are happy to announce that we have partnered with WeForest, and we have committed to offset our carbon footprint by planting trees significantly over the coming years. We have started to plant from this year. Click here to read more about it.

We Are Impedans Series - Quality Engineer, Ewa Utratna

In the next post in the We Are Impedans series, we chat with our Quality Engineer, Ewa Utratna. In this edition Ewa shares her passion for Quality Assurance and how she enjoys her work at Impedans.

Octiv VI Probe Application Note

Plasma polymerization offers a favourable method for coating surfaces with thin films of specific chemical functionality such as aldehydes, carboxylic acids, alcohols, etc. These coatings enable materials to be used for a variety of applications ranging from biomaterials, polymer grafting, and nanoparticle at- tachment. Inorganic phosphate coatings have been used previously for corrosion prevention, mineral dispersion and rheological modification.

We Are Impedans Series - Production Manager, David Finlay

In our sixth We Are Impedans series, we chat with our Production Manager, David Finlay. In this edition David shares his passion for Electronic Engineering and how he enjoys his work at Impedans.

Octiv VI Probe Application Note

Capacitively coupled plasma (CCP) reactors are used in a wide range of plasma processing applications. The physical processes that control the fundamental plasma properties are still not fully understood.

We Are Impedans Series - Embedded Engineer, Mike O'Keeffe

In our fifth We Are Impedans series, we chat with our Embedded Engineer, Mike O'Keeffe. In this edition Mike shares his passion for Electronic Engineering and how he enjoys his work at Impedans.

Moduli | RF Spectrometer

RF Spectrometer Non Invasive Fault Detection

The RF Spectrometer has arrived

The RF Spectrometer is a non-invasive plasma sensor that works by analyzing the RF emitted by the plasma through a view port. This is designed for fault detection on production tools without the need for an in-line sensor in the RF path. It has been proven to detect air leaks, wafer displacement and other serious plasma faults.

Langmuir Probe studied in EEPF Characteristics

RF inductively coupled hydrogen plasmas have many applications including plasma etching for semiconductor processing and neutral beam generation for fusion experiments. A better understanding of the physical processes that govern the hydrogen plasma properties will enable better plasma control. In this study, the authors investigate the characteristics of the electron energy probability function (EEPF) in an expanding, hydrogen, inductively coupled plasma powered separately at 2 MHz and 13.56 MHz.

Semion RFEA and Langmuir Probe Application Note

Inductively coupled plasmas (ICPs) with radiofrequency (RF) biased pedestals are commonly used in the semiconductor industry for nanoscale etch and deposition processes. In this study, the authors investigate the sputter etch rate of SiO2 in this type of reactor as a function of ICP and RF-bias power. The key parameters measured were the ion energy distribution (IED), ion flux and sputter etch rate.

Industry 4.0 Resource List in 2019

Industry 4.0 Resource List

Industry 4.0 Resource List

To help you start off on the right foot, we've gathered some valuable insights relating to Industry 4.0 and Smart Manufacturing.

But first, what is Industry 4.0?

We Are Impedans Series - Head of Sales, Chanel Linnane

In our fourth We Are Impedans series, we chat with our Head of Sales, Chanel Linnane. In this edition Chanel shares her passion for plasma physics and why she left industry to join Impedans to become the Head of Global Sales.

We Are Impedans Series - JJ Lennon, COO

In our third We Are Impedans series, we chat with our COO, JJ Lennon. In this edition JJ shares his journey from starting off as a mechanical engineer to becoming the Chief Operations Officer.

Is Fusion Plasma Research The Answer To Space Travel?

14th Space X launch - Space Thrusters
Plasma thrusters have the potential to revolutionise the aerospace industry for the better. But how? Plasma thrusters offer the best technology solution for space travel by using plasma beams instead of ion sources.

We Are Impedans series - Andy Correa, Full Stack Developer

In our second We Are Impedans series, we chat with our full stack developer, Andy Correa. In this edition you will read about an ex pâtissier who put up his chef hat for the glamorous life of a coder.

We Are Impedans Series - Panos Iosifidis

Welcome to the first interview with our software engineer, Panos Iosifidis, in our We Are Impedans Series. In this series you will find out about the talent behind the Impedans name from our software engineers to our scientists. To get us started, Panos describes his experience so far.

Mayor’s office of China’s Silicon Valley interrogates Irish high technology Company.

The deputy district mayor of Shenzhen, Liu Zhiyong and a delegation from the Shenzhen Financial Development Office meeting the Management Team at Impedans Ltd.
Deputy District Mayor Liu Zhiyong, PhD, of Shenzhen (also known as China’s hardware Silicon Valley) at a meeting today in Dublin with Irish technology company Impedans Ltd. The Deputy Mayor is chasing high quality technology companies to establish in Shenzhen, which has grown from a population of 300,000 to over 13 million people in the last three decades.

Interview with SOSV General Partner, Bill Liao

Bill Liao

From its inception in 2004, Impedans has had a vision to put intelligent sensors on every plasma processing tool to measure what is often thought impossible i.e. the complex characteristics of the plasma state of matter used for surface modification. Find out what Bill has to say about the industry and Impedans.

How to identify vital signs of a plasma process

Exclusive blog on Plasma Health

The human body is extraordinarily complex. Our physical and mental performance is dependent on the health and fitness of our major organs. As long as we keep our vital organs in good condition, we can work with optimum efficiency. We generally know how well our bodies are functioning. Occasionally, we feel under the weather and we may consult a GP for a diagnosis. The GP will want to check some or all of your vital signs; pulse rate, body temperature, respiration rate and blood pressure.

Admittedly, I am no GP, but I find an interesting analogy between the health of the human body and that of a plasma processing tool! Lets look at the vital signs with this analogy in mind.

Pulse rate and pulse shape (ECG) are critical indicators of our cardiovascular health. The heart really is the bodies main power supply. Modern plasma processes are also driven by pulsed RF power supplies. Just like the human body, the pulse rate and pulse shape are critical parameters to be monitored to determine the stability of the plasma process.

Click to read more


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