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Happy holidays from all at Impedans

Our office closes Friday, December 22nd at 5 pm and re-opens Tuesday, January 2nd at 9 am.
Enjoy the holidays!

New: Impedans TV | The Octiv™ Range

Impedans TV

Impedan's TV: The OCTIV™ | RANGE

For our latest video series we're shining a spotlight on our line of next generation RF sensors: The Octiv™ Range. In July we launched Octiv 2.0: a significant upgrade to the Octiv™ product range which provides a major improvement in performance in non-50 ohm environments. To achieve this, the calibration method has been redesigned and improved. Therefore, it is classified as a new product and existing Octiv™ models will be phased out. Existing Octiv™ customers, with compatible models, will be automatically upgraded to Octiv™ 2.0 during the next scheduled calibration.

To celebrate this, Impedans TV has produced a series of videos covering the Octiv hardware, software and demonstrating its abilities in frequency agility, waveform reconstruction and pulsed profile. Check out the first installment below and find the following parts at Impedans TV.

Introducing Impedans Case Study Series

Introducing Impedans Case Study Series

Case Study 1 - NASDAQ 100 Company Reduces Production Costs with Octiv VI Probe Technology

The first in our case Study Series examines how Impedans RF and Mechanical design teams aided a NASDAQ 100 Technology company, who needed to improve the performance and extend the lifetime of an aging fleet of plasma etching tools. Through the integration of Impedans Octiv Sensing Platform, this long-time Impedans client was able to reduce production costs and increase product throughput dramatically, and thus make substantial savings, directly as a result.

Introducing the Alfven | 100 RF Event Detector

Alvfen | 100 RF Event Detector from Impedans, prevent product scrap, reduce cost, detect arc events, network enabled

Impedans are proud to introduce the Alfven | 100 RF Event Detector.

The Alfven | 100™ RF Event Detector is designed to monitor short-lived, unexpected events in RF and plasma processes, that can cause product scrappage and significant cost to the manufacturer. 
Plasma processes, in semiconductor (and related industries), such as plasma etching, PVD and PECVD are susceptible to events such as arcs, instabilities and ignition phenomena. The Alfven | 100™ will detect these events and send real-time warnings to the operator to enable corrective action. 

More information can be found on the product page.

AVS 64th International Symposium & Exhibition

Join Impedans at AVS 64th booth 529 Oct 31 - Nov 02 in Tampa, FL

We are exhibiting at AVS where you can talk to Matthew and Thomas about your plasma measurement needs:

AVS 64th International Symposium & Exhibition
October 31st - November 02nd
Tampa Convention Center, Florida

Calling all Developers

Calling all Developers - we're hiring!

Impedans are looking for a Full Stack Developer to join our team.

Are you an applications developer with experience developing web applications using Python, Django, JavaScript and SQL?

If so, get in touch with us to find out more about our current opening, we'd love to hear from you.

We're hiring!

Impedans are looking for a Sales star

Impedans are looking for a Sales Star to join our technical sales team.

Are you a recent college graduate with a background in Physics, Engineering or a related discipline with an interest in the world of plasma processing and intelligent sensors?

If so, get in touch with us to find out more about about our current opening, we'd love to hear from you.

SVC TechCon 2017 - 60th Annual Technical Conference

If you're attending the 60th Annual TechCon next week at at the Rhode Island Convention Center, don't miss the latest developments in Plasma Measurement from Impedans. Michelle and Chris will be in attendance on Tuesday and Wednesday and will be delighted to talk about any of your Plasma measurement needs.

SVC TechCon 2017 - 60th Annual Technical Conference
April 29 - May 4, 2017
Rhode Island Convention Center,
Providence, Rhode Island.

Happy Easter from all at Impedans

Easter Bunnies - Happy Easter from the Impedans team

From all of us at Impedans, wishing you a happy Easter. In case you need to contact us, please note our office is closed on Monday 17th April but will re-open as usual on Tuesday 18th April.

Plasma Supervision with Mike Hopkins

Impedans founder presents at Plasma Supervision workshop.

Impedans founder and CEO, Mike Hopkins, is presenting a talk on VI Technology at the Plasma Supervision workshop during the (apc|m) Conference at the Gibson Hotel, Dublin on the 10th of April 2017. The European Advanced Process Control and Manufacturing (apc|m) Conference is directed to manufacturers, suppliers and scientific community of semiconductor, photovoltaic, LED, flat panel, MEMS, and other related industries. The topics are focused on current challenges and future needs of Advanced Process Control and Manufacturing Effectiveness.

More information can be found on the conference can be found here.

Happy St. Patrick's Day 2017

May you be as Irish as us on St Patrick's Day this year

We've created a custom Gaelic version of our company logo for Paddy's Day 2017.

Everyone at Impedans would like to wish you a very happy St. Patrick's day.

Impedans is closed for St. Patrick's day so the whole nation can celebrate. We will reopen on Monday, March 20th.

International Women's Day


Impedans are proud to support their female employees on International Women's Day and every other day..

IWD is a celebration of the achievements of women in all aspects of life. This day has been adopted to bring gender equality to the fore and to recognise the contribution of women in our society. There have been leaps and bounds but we're not there yet. Employers play a vital role in empowering women. At Impedans, flexible working hours are offered to their employees, helping working mums balance career and family goals. Getting the balance in teams is vital to the health of any organisation. #BeBoldForChange

Happy Valentine's Day!

Valentine's Day

Roses are red...

Plasma is... well it depends on the chemical nature of the process gas but also its density and the degree of contamination.

We're scientists, not poets!

Wishing all our friends and customers a romantic Valentine's Day!

Happy Lunar New Year 2017 - Year of the Rooster

Chinese New Year 2017 - Year of the Rooster - Lunar New Year

Everyone at Impedans would like to wish our customers and friends in Asia and those around the world celebrating Spring Festival, a very Happy Lunar New Year for 2017.

May happiness and prosperity follow you throughout the year.

Don't forget to wear red to drive away bad luck and evil spirits (it has to be bought for you by someone else), and face away from Tai Sui, the God of Age star.

Quantum Technology - Application Note QC02

Quantum Technology

Measurement of deposition rates and ion energy distributions using the Quantum system

Learn how metal deposition rates, ionization fraction and energy distribution of ions arriving at a substrate are measured in an asymmetric, bipolar, pulsed DC magnetron sputtering reactor.

Seasons Greetings 2016!

Our office closes Friday, December 23rd at 5 pm and re-opens Tuesday, January 3rd at 9am.
Enjoy the holidays!

Happy Thanksgiving!

Happy Thanksgiving from Impedans #TurkeyDay

The Impedans team would like to wish our US customers, friends and acquaintances a very enjoyable Thanksgiving.

Octiv VI Probe Technology - Industrial Communication Protocols

Octiv Ethernet Protocols

Industrial Communication Protocols

Learn about communication protocols and how the Industrial Octiv has been developed to enable fast, reliable, scalable, real-time communication of measurements through ethernet networks.  

AVS 63rd International Symposium & Exhibition

Impedans exhibiting at AVS63, Music City Center, Nashville, November 2016

In November we will be at AVS where you can talk to Michelle and Chris about your plasma measurement needs:

AVS 63rd International Symposium & Exhibition
November 8-10th
Music City Center, Nashville, Tennessee

Octiv VI Probe Technology - Technical Note Part II

Octiv VI Probe Technology - Standards of Calibration

Octiv VI Probe Technology - Voltage | Current | Phase | Impedance
Octiv VI Probe Technology - Standards of Calibration


This technical note describes the uncertainty in measurements and standards of calibration for Octiv VI Probe technology. High power radio-frequency (RF) voltage and current sensors need to be accurately calibrated to a traceable standard. Calibrating to high accuracy can be the most challenging aspect of high power, voltage-current sensor (VI probe) manufacture. This is due to the many sources of error in any calibration process. If the calibration is performed accurately and correctly, then most errors can be characterized and removed.

Learn more about our Octiv system here

GEC2016 - 69th Gaseous Electronics Conference RUB, Bochum

Impedans exhibiting at GEC2016, RUB, Bochum, October 2016

Octiv VI Technology - Technical note

Octiv VI Probe Technology - Theory of Operation

Octiv VI Probe Technology
Octiv VI Probe Technology - Voltage | Current | Phase | Impedance


This technical note describes the theory and architecture behind Octiv VI Probe technology. The Octiv VI probe is an advanced RF voltage and current sensor, which can provide real-time information on complex loads. Real-time information the Octiv provides includes voltage, current, phase, power and impedance on all harmonics of a chosen frequency simultaneously, as well as transmission line parameters such as forward power, reflected power, standing wave ratio (SWR) and reflection coefficient. The Octiv sensor was designed to meet the need for post-match voltage and current measurements in RF excited plasma processes.

Learn more about our Octiv system here

Vertex - the theory behind ion current as a function of angle

Ion angular distribution measurements with a planar retarding field analyser

Ion angle determination with current derivative
The Vertex Multi Sensor measures the ion energy distribution as a function of aspect ratio hitting a surface inside a plasma reactor from multiple locations to analyse the uniformity of ion interactions across a substrate.


In this application note, we present a novel method which can be applied to a planar retarding field energy analyser (RFEA) for the measurement of ion angular distributions. Ion energy and angular ion distributions play a critical role in plasma assisted etching and conformal deposition processes. Ion impact at wider angles may be required for better step coverage in certain sputter deposition and ion implantation processes while large angle ion impact can be detrimental to anisotropic etch processes. In the early 80’s, Stenzel et al 1, 2 developed a directional RFEA where particles are geometrically filtered through a micro-capillary plate prior to energy analysis. The high aspect ratio (AR) of the holes/channels in the plate allowed them to select particles within a geometric acceptance angle. The Vertex RFEA design has a variable AR, controlled using a potential difference between two grids (see application note VE02). A variable AR controls the ion angular spread passing through the sensor for detection. The Vertex product produces a plot of ion energy distribution versus AR.

Learn more about our Vertex system here

PSE 2016

Thanks to all who stopped by booth #43 to chat with Chanel and Michelle at the 15th International Conference on Plasma Surface Engineering in Garmisch Partenkirchen last week.


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