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Application Notes Octiv Poly 2.0 Tool Characterization

Electrical characterization of a RF powered micro atmospheric pressure plasma jet using Octiv VI probe

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Application Notes Octiv Suite 2.0

Ion flux measurements using Octiv VI Probe to study the deposition rates in plasma polymerization process

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Application Notes Langmuir Probe Octiv Poly 2.0 virtual metrology

Correlation between plasma parameters and Impedans Octiv VI probe measurements using Regression Analysis

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Application Notes Fundamental Research Langmuir Probe Model Validation

Impedans Langmuir Probe used for electron density measurements in dusty plasma produced by Coaxial Gridded Hollow Cathode Discharge

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Application Notes Fundamental Research Langmuir Probe Model Validation

Impedans’ Langmuir Probe used to study the EEPF characteristics of an expanding inductively coupled hydrogen plasma.

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Application Notes Fundamental Research Langmuir Probe

Langmuir Probe used in experimental and numerical investigations of the phase-shift effect in capacitively coupled plasma discharges

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Application Notes Fundamental Research Langmuir Probe

Langmuir Single Probe used in determining the temporal evolution of negative ion density in the afterglow of reactive HiPIMS

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Application Notes Fundamental Research Langmuir Probe Tool Characterization

Plasma diagnostics of low-pressure high-power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma using Impedans Langmuir Probe

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Application Notes Langmuir Probe Tool Characterization

Measurements of plasma parameters in a BAI 730 M triode ion plating system using Impedans Langmuir probe

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Application Notes Fundamental Research Langmuir Probe Tool Characterization

Measurements of two-temperature electrons in magnetron sputtering plasma using Impedans Langmuir probe

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Application Notes Langmuir Probe Tool Characterization

Plasma plume characterization of a Hall Effect Thruster using Impedans Langmuir probe

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Application Notes Langmuir Probe Process End Point Detection

Floating potential measurements using Impedans Langmuir Probes for End Point detection in a plasma etching process of polymers