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A note from our CEO Dr. David Gahan

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Ion beam assisted chemical vapor deposition of hybrid coating – Process diagnostics and mechanisms using Impedans Plato Probe

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Ion energy distribution measurements with Impedans Semion RFEA in Si -ALE using Cl2

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Blog Post

Navigating the Angstrom Age – Crafting Precision in Semiconductor Manufacturing

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Evaluation of Plasma Parameters Using the Impedans Langmuir Probe in HiPIMS and DCMS Systems

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Plasma Characterization in a Laser-Plasma Hybrid Welding System Using the Impedans Langmuir Double Probe

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Impedans Semion RFEA used for Ion energy measurements in Asynchronously Pulsed Plasma during High Aspect Ratio Nanoscale Si Trench Etching

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Application Notes Applications Fundamental Research Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 Process Performance

Bias potential measurement with Octiv VI probe during atomic layer etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers