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Applications

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Measuring the Ion Impact Energy and Ion Flux onto substrates in a variety of plasma sources

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Measuring the bulk plasma parameters, such as density and temperature in a variety of plasma sources

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Measuring the Power delivered and the electrical characteristics of the RF network and plasma.

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Applications

Read the latest research using our instruments to characterise Magnetron Sputtering processes

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Read the latest research using our instruments to characterise Thruster processes.

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Read the latest research using our instruments to characterise Pulsed RF processes.

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Read the latest research using our instruments to characterise Atmospheric Plasmas.

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Read the latest research using our RFEA instruments to characterise Commercial tools

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Our RFEA Systems have been used to help characterise a variety of Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE) systems

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Our RFEA's have been used to help characterise a variety of Dual Frequency systems

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Our Langmuir probe has be used to help characterise a variety of Microwave (MW) plasma sources.

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Using our Quantum RFEA to help transfer a process from a R&D tool to a production tool.

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using our Octiv VI probes to characterise your matchbox

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