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Building upon the canvas of semiconductor manufacturing intricacies painted in Part 1, our journey into the Angstrom age takes a leap with the spotlight on the crucial players—the advanced sensors and Voltage-Current (VI) Probes.
Recapping briefly from our previous installment, we underlined the vital need for direct plasma measurement, steering away from relying solely on predictive models driven by process inputs. In this blog, we hone in on VI Probes, the eyes of the system, to reveal their transformative role in semiconductor manufacturing.
VI Probes, operating in the invisible RF spectrum, serve as sophisticated eyes, offering unparalleled visibility into plasma dynamics. These probes aren’t just observers; they actively contribute to the precision of semiconductor manufacturing. The standout feature of VI Probes lies in their ability to measure voltage, current, power, and impedance.
Imagine these probes as dynamic guardians, continuously monitoring the condition of the plasma chamber. The impedance measured correlates with the chamber’s health, offering real-time insights into deviations, instabilities, or endpoint variations.This live monitoring capability empowers fabs to take proactive measures, ushering in a new era of predictive maintenance.
Beyond their role as health monitors, VI Probes delve into the nitty-gritty of the plasma’s behavior. The current they measure correlates with the ion flux, providing a real-time gauge of the material deposition or etching process. Simultaneously, the voltage measurement correlates with ion energy, a critical factor in processes sensitive to variations.
A key strength of VI Probes is their continuous monitoring over time. This feature allows them to detect process drifts, defects, and endpoints live on the plasma tool. Imagine having eyes that not only see the present but also foresee potential challenges, offering an unprecedented level of control and adaptability on the production floor.
Moreover, the accuracy of VI Probes is on an upward trajectory. As these probes evolve, they enable live chamber-to-chamber matching, ensuring uniformity and precision across semiconductor manufacturing processes.
As the semiconductor industry advances towards greater miniaturization and enhanced performance, the plasma processing systems are evolving to be more intricate and compact. The Impedans Octiv VI probe, featuring a selection of 5 fundamental and 15 harmonic frequencies, ensures an impressive 99% true accuracy in chamber-to-chamber matching, enhancing overall process reliability. This sensor is meticulously crafted for advanced research and development, as well as real-time process monitoring, incorporating pulse monitoring capabilities and waveform construction to meet the demands of the dynamic semiconductor landscape.
Impedans continues to advance Octiv VI Probe’s capabilities to enable enhanced control and efficiency in plasma-based applications, supporting the development of next-generation semiconductor technologies.
To know more about Impedans VI probes and how we can help you better understand your plasma contact us at [email protected]