Impedans Semion RFEA and Octiv VI probe used to measure Ion Properties and Electrical Characteristics of a 60 MHz Magnetron Discharge
Impedans Semion for Ion Energy Measurements in the Advancement of Piezoelectric Energy Harvesting for Space Applications
Impedans Langmuir Probe used to improve performance of an RF Plasma implanter for creating high concentration of dopants
Octiv VI probe application for surface wettability control and fluorination of amorphous carbon films
Impedans Langmuir Probe used for the etching process of magnetic tunnel junction materials in random access memory devices
Optimization of plasma polymerization process with the Impedans Octiv VI probe for polymer film depositions
Impedans Semion provides key ion energy measurements required for the development of Vertical Graphene through PECVD process
Impedans Langmuir probe used in the optimization of thin film deposition process employing microwave assisted reactive HiPIMS.
Ion beam assisted chemical vapor deposition of hybrid coating – Process diagnostics and mechanisms using Impedans Plato Probe
Plasma Characterization in a Laser-Plasma Hybrid Welding System Using the Impedans Langmuir Double Probe
Impedans Semion RFEA used for Ion energy measurements in Asynchronously Pulsed Plasma during High Aspect Ratio Nanoscale Si Trench Etching
Bias potential measurement with Octiv VI probe during atomic layer etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers
Impedans’ Semion and Langmuir Probe systems used to study the SiO2 sputter etch rate in RF-Biased ICP discharge
Langmuir probe used in a lunar dust application to measure the electron density and energy distribution
Semion retarding field energy analyzer used to investigate reactive HiPIMS + MF sputtering of TiO2 crystalline thin films
Using Impedans Semion RFEA System to measure the effect of gas pressure on Ion Energy in a very-high frequency (VHF) magnetron sputtering discharge.
Investigation of the performances of the microwave plasma source ‘Aura-wave’ by Impedans Langmuir Probe System
In-Orbit Demonstration of Novel Thruster, characterized by Impedans Semion Retarding Field Energy Analyzer
Effect of substrate biasing on the ion properties of a magnetron sputtering system using Impedans’ Semion RFEA System and Octiv Suite 2.0 VI Probe
Measurements of plasma produced by Inductively coupled array (INCA) with Impedans’ Langmuir Probe, Semion RFEA System and Octiv VI Probe
Electron negativity measurements during E to H transition in RF inductively coupled plasma using Impedans’ Langmuir Probe System
Measurement of DC self bias and Ion flux using Impedans Octiv VI probe during plasma polymerization process in an asymmetric capacitively coupled plasma
Tailored ion energy distribution measurements at an rf-biased plasma electrode using Impedans’ Semion RFEA System
The magnetic asymmetry effect in geometrically asymmetric RF capacitively coupled plasmas, characterized with Impedans’ Octiv Suite 2.0 VI probe and Semion RFEA system
The effect of driving frequency on the IVDF in a magnetron sputtering system using Impedans’ Semion RFEA System
Experimental characterisation of a vacuum arc thruster using Impedans’ Semion Pulsed DC retarding field energy analyzer
Ion flux and energy measurement using Impedans Semion system in silicon etching with a pulsed HBr/O2 plasma.
Experimental investigations on time resolved characteristics of pulsed inductively coupled O2 /Ar plasmas using Impedans Langmuir Probe.
Application of Impedans Langmuir Probe and Octiv Poly in ICP argon discharge to study electron kinetics and spatial transport
AImpedans Langmuir Probe and Octiv Suite are used to study the time dependencies of pulsed inductively coupled Ar and Ar/CF4 discharges
Determination of ion and neutral deposition rates using a quartz crystal microbalance and a gridded energy analyzer
Application of the Impedans Moduli RF Spectrometer for Detecting Clean and Small Open Area Etch Endpoints through RF Harmonic Emission from Plasma
Ion energy measurements of ions emitted by a mini-helicon thruster using Semion retarding field energy analyzer
Ion flux measurements using Octiv VI probe in RF Plasma Polymerisation of Furfuryl Methacrylate (FMA)
Impedans Octiv VI Probe used to study the relation between ion flux and deposition rate of organophosphate thin films in plasma
Electrical characterization of a RF powered micro atmospheric pressure plasma jet using Octiv VI probe
Ion flux measurements using Octiv VI Probe to study the deposition rates in plasma polymerization process
Correlation between plasma parameters and Impedans Octiv VI probe measurements using Regression Analysis
Impedans Langmuir Probe used for electron density measurements in dusty plasma produced by Coaxial Gridded Hollow Cathode Discharge
Impedans’ Langmuir Probe used to study the EEPF characteristics of an expanding inductively coupled hydrogen plasma.
Langmuir Probe used in experimental and numerical investigations of the phase-shift effect in capacitively coupled plasma discharges
Langmuir Single Probe used in determining the temporal evolution of negative ion density in the afterglow of reactive HiPIMS
Plasma diagnostics of low-pressure high-power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma using Impedans Langmuir Probe
Measurements of plasma parameters in a BAI 730 M triode ion plating system using Impedans Langmuir probe
Measurements of two-temperature electrons in magnetron sputtering plasma using Impedans Langmuir probe
Floating potential measurements using Impedans Langmuir Probes for End Point detection in a plasma etching process of polymers
Time-resolved plasma characterization of modulated pulsed power magnetron sputtering using a Langmuir probe
Ion energy distributions measured at the biased electrode in bipolar pulsed DC discharges of methane using Impedans Semion RFEA
Impedans Semion RFEA for Ion flux and ion energy distribution function measurements in synchronously pulsed inductively coupled plasmas
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