Impedans Semion RFEA System is used in Silicon etching in a pulsed HBr/O2 plasma – Ion flux and energy analysis Post date March 30, 2023 ← Experimental characterization of a vacuum arc thruster using Impedans’ Semion Pulsed DC retarding field energy analyzer → Experimental investigations on time resolved characteristics of pulsed inductively coupled O2 /Ar plasmas using Impedans Langmuir Probe.
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